Open AccessTuning the phase transition of ZnO thin films through lithography: an integrated bottom‐up and top‐down processing
Author(s) -
Malfatti Luca,
Pinna Alessandra,
Enzo Stefano,
Falcaro Paolo,
Marmiroli Benedetta,
Innocenzi Plinio
Publication year - 2015
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577514024047
Subject(s) - lithography , materials science , microfabrication , thin film , nucleation , photolithography , nanotechnology , wurtzite crystal structure , synchrotron , phase (matter) , zinc , x ray lithography , chemical engineering , optoelectronics , resist , layer (electronics) , optics , fabrication , chemistry , metallurgy , organic chemistry , engineering , alternative medicine , pathology , physics , medicine
An innovative approach towards the physico‐chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol–gel method and then exposed to hard X‐rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating agents in the sol allows easy‐to‐pattern films made by an organic–inorganic matrix to be deposited. The exposure to hard X‐rays strongly affects the nucleation and growth of crystalline ZnO, triggering the formation of two intermediate phases before obtaining a wurtzite‐like structure. At the same time, X‐ray lithography allows for a fast patterning of the coatings enabling microfabrication for sensing and arrays technology.
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