z-logo
open-access-imgOpen Access
Investigation of the electrical performance of hfo2dielectrics deposited on passivated germanium substrates
Author(s) -
Qifeng Lu,
Yifei Mu,
Yijie Zhao,
Chengzhi Zhao,
Stephen Taylor,
Paul R. Chalker
Publication year - 2017
Publication title -
iop conference series materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/201/1/012029
Subject(s) - germanium , passivation , materials science , thin film , dielectric , analytical chemistry (journal) , diffraction , annealing (glass) , chemical engineering , silicon , optoelectronics , chemistry , nanotechnology , composite material , optics , chromatography , layer (electronics) , physics , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom