Open AccessPorous silicon fabrication by electrochemical and photo-electrochemical methods
Author(s) -
Taebaraek Safaa Atta,
Mauyyed Jabar Zoory,
Nada R. Ahmed
Publication year - 2021
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1963/1/012153
Subject(s) - porous silicon , materials science , electrochemistry , silicon , crystallite , etching (microfabrication) , fabrication , porosity , chemical engineering , diffraction , nanotechnology , optoelectronics , composite material , optics , chemistry , metallurgy , electrode , medicine , alternative medicine , physics , layer (electronics) , pathology , engineering
n and p types of porous silicon were fabricated using two methods electrochemical etching EC and photo-electrochemical etching PEC. Structural studies of both types of porous silicon were carried out by X-Ray Diffraction XRD getting 24.5 nm crystallite size in p-PSi and 28.05 nm in n-PSi, AFM, Fourior-Transformation InfraRed FT-IR.