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Hydrogenated ultra-thin tin films predicted as two-dimensional topological insulators
Author(s) -
B. Fa-Chun Chou,
Zhi-Quan Huang,
Chia-Hsiu Hsu,
FengChuan Chuang,
Yu-Tzu Liu,
Hsin Lin,
Arun Bansil
Publication year - 2014
Publication title -
new journal of physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.584
H-Index - 190
ISSN - 1367-2630
DOI - 10.1088/1367-2630/16/11/115008
Subject(s) - tin , topological insulator , metal , thin film , physics , bilayer , passivation , band gap , topology (electrical circuits) , condensed matter physics , nanotechnology , materials science , metallurgy , quantum mechanics , layer (electronics) , chemistry , electrical engineering , membrane , biochemistry , engineering

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