Open AccessThe role of ion implantation in CMOS scaling: A tutorial review
Author(s) -
Michael Current
Publication year - 2019
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.5127674
Subject(s) - scaling , cmos , planar , ibm , engineering physics , optoelectronics , logic gate , channel (broadcasting) , computer science , electrical engineering , electronic engineering , physics , materials science , engineering , nanotechnology , mathematics , computer graphics (images) , geometry
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