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74‐3: Multicolor 1250 ppi OLED Arrays Patterened by Photolithography
Author(s) -
Malinowski Pawel E.,
Ke TungHuei,
Nakamura Atsushi,
Vicca Peter,
Wuyts Magalie,
Gu Danli,
Steudel Sören,
Janssen Dimitri,
Kamochi Yoshitaka,
Koyama Ichiro,
Iwai Yu,
Heremans Paul
Publication year - 2016
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/sdtp.10905
Subject(s) - photolithography , photoresist , oled , subpixel rendering , materials science , optoelectronics , aperture (computer memory) , optics , nanotechnology , physics , layer (electronics) , pixel , acoustics
In this paper, we demonstrate multicolor OLEDs patterned sideby‐side by photolithography. 1250 ppi arrays with 10 μm subpixel pitch are shown. The chemically amplified, i‐line photoresist enables submicron pitch and aperture ratio above 60%. OLED photolithography paves the road to cost‐effective, full‐color displays with 4K and 8K resolution.