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Formation of Nitrogen Functional Groups on Plasma Treated DLC
Author(s) -
LópezSantos Carmen,
Yubero Francisco,
Cotrino José,
Contreras Leopoldo,
Barranco Angel,
GonzálezElipe Agustín R.
Publication year - 2009
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200900019
Subject(s) - dielectric barrier discharge , surface modification , x ray photoelectron spectroscopy , derivatization , diamond like carbon , plasma , nitrogen , analytical chemistry (journal) , contact angle , carbon fibers , materials science , atmospheric pressure , plasma cleaning , chemistry , dielectric , chemical engineering , thin film , nanotechnology , composite material , organic chemistry , mass spectrometry , optoelectronics , chromatography , composite number , oceanography , engineering , quantum mechanics , physics , geology
Diamond like carbon (DLC) thin films have been exposed to different nitrogen containing plasmas. A dielectric barrier discharge (DBD) at atmospheric pressure and a microwave discharge (MW) at low pressure using N 2 and mixtures Ar + NH 3 have been compared. Optical Emission and X‐ray Photoelectron spectroscopies, Atomic Force Microscopy and contact angle measurements have been used for this study. A DBD with Ar + NH 3 is the most efficient method for DLC functionalization. Films treated with this plasma presented the highest concentration of amine groups as determined by derivatization with 4‐chlorobenzaldehyde. All the treated samples underwent a significant aging with time. The efficiency of the different plasmas for DLC functionalization is discussed in the light of the intermediate species detected in the plasma.
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