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A convenient method for electron tomography sample preparation using a focused ion beam
Author(s) -
Wang Xiongyao,
Lockwood Ross,
Vick Doug,
Li Peng,
Meldrum Al,
Malac Marek
Publication year - 2012
Publication title -
microscopy research and technique
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.536
H-Index - 118
eISSN - 1097-0029
pISSN - 1059-910X
DOI - 10.1002/jemt.22044
Subject(s) - tilt (camera) , focused ion beam , materials science , tomography , sample preparation , sample (material) , electron tomography , ion beam , projection (relational algebra) , ion , range (aeronautics) , optics , cathode ray , beam (structure) , analytical chemistry (journal) , electron , computer science , nanotechnology , chemistry , algorithm , chromatography , physics , mathematics , transmission electron microscopy , composite material , scanning transmission electron microscopy , geometry , nuclear physics , organic chemistry
Here we report a new sample preparation method for three‐dimensional electron tomography. The method uses the standard film deposition and focused ion beam (FIB) methods to significantly reduce the problems arising from the projected sample thickness at high tilt angles. The method can be used to prepare tomography samples that can be imaged up to a ±75° tilt range which is sufficient for many practical applications. The method can minimize the problem of Ga + contamination, as compared to the case of FIB preparation of rod‐shaped samples, and provides extended thin regions for standard 2D projection analyses. Microsc. Res. Tech. 75:1165–1169, 2012. © 2012 Wiley Periodicals, Inc.
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