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8.2: Flexible N‐type Organic Thin Film Transistors
Author(s) -
Hung WeiLun,
Yang MingChe,
Tu ChiaHsun,
Hung ShihHsing,
Hwu KehLong,
Hu ChihJen,
Huang WeiMing
Publication year - 2012
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1002/j.2168-0159.2012.tb05714.x
Subject(s) - photolithography , thin film transistor , materials science , spin coating , thin film , optoelectronics , transistor , deposition (geology) , nanotechnology , layer (electronics) , electrical engineering , voltage , engineering , paleontology , sediment , biology
N‐type organic thin film transistors have been successfully fabricated on G1 production line. Simple solution‐spin‐coating method followed by conventional photolithography process is used for all organic thin film deposition and patterning in the devices The devices can be used for electrophoretic display (EPD).