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Use of Supramolecular Assemblies as Lithographic Resists
Author(s) -
Lewis Scott M.,
Fernandez Antonio,
DeRose Guy A.,
Hunt Matthew S.,
Whitehead George F. S.,
Lagzda Agnese,
Alty Hayden R.,
FerrandoSoria Jesus,
Varey Sarah,
Kostopoulos Andreas K.,
Schedin Fredrik,
Muryn Christopher A.,
Timco Grigore A.,
Scherer Axel,
Yeates Stephen G.,
Winpenny Richard E. P.
Publication year - 2017
Publication title -
angewandte chemie
Language(s) - English
Resource type - Journals
eISSN - 1521-3757
pISSN - 0044-8249
DOI - 10.1002/ange.201700224
Subject(s) - resist , supramolecular chemistry , lithography , nanotechnology , electron beam lithography , materials science , nanolithography , supramolecular assembly , etching (microfabrication) , plasma etching , resolution (logic) , chemistry , crystallography , optoelectronics , fabrication , computer science , crystal structure , layer (electronics) , artificial intelligence , medicine , alternative medicine , pathology
Abstract A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.