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Influence of Annealing Treatment on the Physical Properties of c‐BN Films Deposited by IBAD Technique
Author(s) -
Djouadi M.,
Soltani A.,
Thévenin P.,
Bath A.,
Nouet G.
Publication year - 2002
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/1527-2648(20020806)4:8<616::aid-adem616>3.0.co;2-e
Subject(s) - materials science , annealing (glass) , boron nitride , ion beam assisted deposition , thin film , thermal stability , fourier transform infrared spectroscopy , analytical chemistry (journal) , high resolution transmission electron microscopy , deposition (geology) , boron , chemical engineering , composite material , ion beam , nanotechnology , ion , transmission electron microscopy , chemistry , paleontology , organic chemistry , chromatography , sediment , engineering , biology
Boron nitride films prepared by ion beam assisted deposition (IBAD) have been studied. The presence of the cubic phase was checked by HRTEM microscopy. The adhesion of the films was very poor and without a thin boron sublayer, the films delaminated just after deposition. In an attempt to improve the adhesion, post deposition annealing was performed. The structure and the stress of the films were followed by infrared spectroscopy (FTIR). Annealing carried out on c‐BN films shows a thermal threshold of stability around 950 °C. These effects are discussed according to the proportion of the cubic phase present in the film.