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Morphology of Porous Silicon Layers Deduced from Polarization Memory Experiments
Author(s) -
Diener J.,
Kovalev D.,
Polisski G.,
Künzner N.,
Koch F.
Publication year - 2001
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/1521-3951(200103)224:1<297::aid-pssb297>3.0.co;2-4
Subject(s) - porous silicon , materials science , photoluminescence , morphology (biology) , polarization (electrochemistry) , porosity , silicon , ellipsoid , porous medium , optics , crystallography , mineralogy , optoelectronics , composite material , geology , chemistry , physics , paleontology , geodesy
The morphology of porous silicon layers has been investigated by polarization resolved photoluminescence measurements in different geometrical arrangements. A uniaxial alignment of the long ellipsoidal axis of the aspheric Si nanocrystallites (NCs) parallel to the [100] growth direction is found. This overall orientation of the NCs is randomized with decreasing size of the NCs.

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