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Photoemission and conductivity measurement of poly( N ‐methyl aniline) and poly( N ‐ethyl aniline) films
Author(s) -
Athawale Anjali A.,
Deore Bhavana,
Vedpathak Mahesh,
Kulkarni Sulabha K.
Publication year - 1999
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19991031)74:5<1286::aid-app26>3.0.co;2-i
Subject(s) - aniline , x ray photoelectron spectroscopy , polymer chemistry , conductivity , polymerization , photoemission spectroscopy , materials science , chemistry , polymer , organic chemistry , chemical engineering , engineering
The studies involve the X‐ray photoelectron spectroscopy (XPS) and conductivity measurements of poly( N ‐methyl aniline) and poly( N ‐ethyl aniline) films deposited electrochemically at different pH values of −0.96, 2.22, and 3.78 for N ‐methyl aniline and 1.10, 2.22, and 3.78 for N ‐ethyl aniline. The results obtained reveal significant differences in the film properties of the two matrices as a function of pH of solution. These differences are explained on the basis of the competitive reaction products formed during polymerization in the two matrices along with the differences in the electron‐donating ability of the methyl and ethyl groups present on the nitrogen (N) atom. These results are further supported by the UV–Visible and IR data. © 1999 John Wiley & Sons, Inc. J Appl Polym Sci 74: 1286–1292, 1999
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