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To efficiently align the creation of defect center with photonics structurein nanoscale precision is one of the outstanding challenges for realizinghigh-performance photonic devices and the application in quantum technologysuch as quantum sensing, scalable quantum systems, and quantum computingnetwork. Here, we propose a facile self-aligned patterning technique whollybased on conventional engineering technology, with the doping precision canreach ~15nm. Specifically, we demonstrate this technique by fabricating diamondnanopillar sensor arrays, which show high consistency and near-optimal photoncounts, high yield approaching the theoretical limit, and high filteringefficiency for different NV centers. Combined with appropriate crystalorientation, a saturated fluorescence rate of 4.65 Mcps and the best reportedfluorescence-dependent detection sensitivity of 1900 cps^(-1/2) are achieved.This technique applicable to all similar solid-state systems should facilitatethe development of parallel quantum sensing and scalable informationprocessing.

Self-aligned patterning technique for fabricating high-performance diamond sensor arrays with nanoscale precision