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The dielectric breakdown approach for forming nanopores has greatlyaccelerated the pace of research in solid-state nanopore sensing, enablinginexpensive formation of nanopores via a bench top setup. Here we demonstratethe potential of tip controlled dielectric breakdown (TCLB) to fabricate pores100$\times$ faster, with high scalability and nanometre positioning precision.A conductive atomic force microscope (AFM) tip is brought into contact with anitride membrane positioned above an electrolyte reservoir. Application of avoltage pulse at the tip leads to the formation of a single nanoscale pore.Pores are formed precisely at the tip position with a complete suppression ofmultiple pore formation. In addition, our approach greatly accelerates theelectric breakdown process, leading to an average pore fabrication time on theorder of 10 ms, at least 2 orders of magnitude shorter than achieved by classicdielectric breakdown approaches. With this fast pore writing speed we canfabricate over 300 pores in half an hour on the same membrane.

Nanopore fabrication via tip-controlled local breakdown using an atomic force microscope