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Wettability is an important property governed by not only chemical composition, but also geometrical structure as well (Ichimura et al., 2000; Lai et al., 2009a; Wang et al., 1997). Super-wetting and antiwetting interfaces, such as superhydrophilic and superhydrophobic surfaces with special liquid-solid adhesion have recently attracted worldwide attention. Superhydrophilicity and superhydrophobicity are defined based on the conventional water contact angle experiment. If the contact angle is smaller than 5°, the surface is said to be superhydrophilic. Superhydrophobic refers to surface with contact angle greater than 150°. Such two extremely cases have attracted much interest due to their importance in both theoretical research and practical application (Lafuma & Quere, 2003; Liu et al., 2010; Gao & Jiang, 2004). In recent years, patterned thin films have received considerable attentions due to their interesting properties for a range of applications, such as optoelectronic devices, magnetic storage media, gas sensors, and fluidic systems. Compared to the conventional thin film technology, such as physical vapor deposition (Li et al., 2006; Zhang & Kalyanaraman, 2004), chemical vapor deposition (Jeon et al., 1996; Slocik et al., 2006) and sputtering (Rusponi et al., 1999), solution-based deposition method is becoming popular for the fabrication of patterning films due to the low temperature process under ambient environment, less energy and time consumption, and easier control of the experimental parameters (Lai et al., 2010a; Liu et al., 2007; Yoshimura & Gallage, 2008). Although traditional photolithographic technique is excellent for preparing sub-micrometer or even only sub-100-nanometer pattern (Cui & Veres, 2007; Li et al., 2009), it is a complex multi-step process (wafer cleaning; barrier layer formation; photoresist coating; soft-baking; mask alignment; exposure and development; and hard-baking) and needs to remove part of the film and all the photoresist used. Direct and selective assembly of nanostructured materials from precursors paves a new avenue for the fabrication of electronic optical microdevices. Wetting micropatterns with different physical or chemical properties, without the need for ultra-precise positioning, have frequently been acted as templates for fabricating various functional materials in a large scale. The great difference in contact angle of the two extreme cases provides a potentially powerful and economical platform to directly and precisely construct patterned nanostructures in aqueous solution. In general, wetting micropatterns

Extremely Wetting Pattern by Photocatalytic Lithography and Its Application