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Residual stress is one of the key factors that directly determines the optical quality of micro-optical devices. With the same residual stress, the larger the aperture is, the worse the optical quality is. Therefore, continuous micromirrors are more affected by residual stress than segmented micromirrors. However, due to the complexity of boundary conditions, the influence of residual stress in segmented micromirror arrays on the device performance has been widely investigated in theory and practical applications, but only a few research results about the influence of residual stress in the continuous micromirror arrays have been reported. In this work, the residual stress both in continuous and segmented micromirror arrays is analyzed and summarized, then an accurate model for continuous micromirrors is developed. Compared with the existing models, it combines two additional factors, layer plate and point supported boundary conditions. Based on the proposed model, the change of critical stress of continuous micromirrors induced by different thicknesses of residual stress compensated membrane is theoretically investigated. Finally, the compensating experiment has been carried out, and the results show that the optical quality of micromirror can be remarkably improved, almost two orders of magnitude, with the introduction of residual stress compensation.

Study of Residual Stress Compensation in Continuous Membrane Micromirrors Based on Surface Micromachining Processes