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Generally, thin-film metal glass (TFMG) is deposited using two or more elemental targets. Thus, achievement of a homogeneous coating during mass production is difficult. As a new method of TFMG deposition, a single target with high glass-forming ability (GFA) has been used to improve the sputtering process, facilitating easy processing and broad application of sputtering targets. In this study, three kinds of targets (i.e., cast, amorphous, and crystalline targets) are prepared via casting and powder processes. The thermal and mechanical properties of the three targets prepared using the various methods are investigated, and the crystalline target is found to be the most thermodynamically and mechanically stable of the three alternatives. In addition, for TFMG deposited using the microcrystalline target, excellent compositional uniformity between the target and coating is achieved. Therefore, this study experimentally demonstrates that a fine crystalline target is most suitable for use as a multi-component single target in GFA manufacturing methods. These findings are expected to facilitate commercial use of TFMGs.

Preparation of Zr-Al-Mo-Cu Single Targets with Glass Forming Ability and Deposition of Thin Film Metallic Glass