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(Co35Fe65 )B magnetic films with an Ru underlayer were fabricated and characterized using a triple carrousel sputtering method. The high velocity movement of a substrate brought that the Ru underlayer and B enhanced uniaxial anisotropy field with increasing elongation of the lattice parameter, preferred orientation in the CoFe crystalline bct phase. In this study, we examined the uniaxial anisotropy field by using a simulator of sputtering particles deposited on a substrate moving at high velocity. As a result, we found that an anisotropic incidence existed. The simulation result suggested that sputtered Fe and Co particles in the range of energy had the potential of those oblique incident in the direction of the substrate movement.

Anisotropically Incident Effect of Sputtering Particles on the High Anisotropy Field of a CoFeB Film in the Carrousel Sputtering Method