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This paper used magnetron sputtering to grow ZnO film on Al2O3 substrate. All the samples were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), ultra-violet spectrometer (UVS) and photoluminescence (PL). Results showed that: the doped ZnO thin films were still had the hexagonal wurtzite structure; the magnetron sputtering coated samples' transmission edge would have blue shift and then red shift along with the increase of the annealing temperature; all samples had decent luminescent property; 0C sputtering coated samples had decent surface flatness and even distribution of particles.

Analysis on the Optical Characteristics of ZnO Thin Film Prepared by Magnetron Sputtering