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Fabrication of micropit array structures on silica glass by fast beam-scanning LIBWE was employed for laser marking of glass materials. Microstructures were fabricated by LIBWE employing a DPSS laser (λ = 355 nm, τ ~ 15 ns) and toluene saturated with pyrene. When the beam scanning speed is low, microtrenches with 30 μm width are formed. On the other hand, micropit array structures can be fabricated under fast beam scanning conditions. Each micropit in an array structure obtained by single scan was fabricated by single laser pulse irradiation. Micropits with maximum depths of up to 0.35 μm could be fabricated by single laser pulse irradiation. For fabricating micropit array structures, the pulse repetition rate becomes an important parameter, since cavitation limits the etching at high pulse repetition rates. The effect of cavitation on etching was investigated by the measurement of transient pressure signals observed upon single and double pulse irradiation. Fabricated micropit array structures can be utilized for fast laser marking of glass materials.

Fabrication of Micropits by LIBWE for Laser Marking of Glass Materials