Open AccessStudy of Leaching Analysis of Immersion Resist Components using the WEXA-2 System
Author(s) -
Atsushi Sekiguchi,
Yuko Matsumoto,
Kenji Okubo
Publication year - 2010
Publication title -
journal of photopolymer science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.266
H-Index - 38
eISSN - 1349-6336
pISSN - 0914-9244
DOI - 10.2494/photopolymer.23.427
Subject(s) - resist , immersion (mathematics) , materials science , leaching (pedology) , immersion lithography , scanner , contamination , composite material , optics , environmental science , soil science , mathematics , physics , layer (electronics) , biology , pure mathematics , soil water , ecology