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The effect of ion-beam treatment, alternating with the magnetron sputtering process, on the properties zinc oxide of thin films is considered. Ion-beam treatment causes a decrease in the growth rate, the size of the coherent scattering regions and resistivity. The stoichiometric index, the band gap and the refractive index increase. The transparency of the films in the area of weak absorption does not change. Физика и техника полупроводников, 2019, том 53, вып. 11

Влияние ионно-лучевой обработки в процессе ВЧ магнетронного распыления на свойства плeнок ZnO