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Leaf gas exchange of six red raspberry (Rubus idaeus L.) and one blackberry (Rubus L. subgenus Rubus Watson) genotypes growing in 12-L containers was measured at four temperatures (20, 25, 30, and 35 °C) once a month for 3 months in growth chambers by infrared gas analysis. Measurements were taken on three successive leaves on the same primocane between the third and seventh nodes (≈75% to 85% of full leaf expansion). The plants were grown in ambient (field) conditions except when measurements were taken. Maximum daily ambient temperatures rose as high as ≈37 °C during this period. Net CO2 assimilation (A), evapotranspiration (ET), and stomatal conductance ( gs) were measured during June, July, and August. Significant differences ( P ≤ 0.01) in A were found among the seven genotypes. 'Arapaho' blackberry displayed the highest mean A rate at all temperatures. Only in the raspberry cultivars Nova and Reveille did the rate of A drop significantly when temperature increased from 20 to 30 °C. 'Reveille' was also the only cultivar in which A significantly declined between 30 and 35 °C. The ET increased significantly over the four temperatures in four cultivars ('Arapaho', 'Heritage', 'Nova', and 'Southland'). The ET rate at 35 °C was higher for 'Arapaho' than for all other cultivars. 'Autumn Bliss', 'Dormanred', and 'Reveille' did not change significantly as the temperature rose from 20 to 35 °C. Stomatal conductance of 'Heritage' and 'Arapaho' did not change significantly between 20 and 35 °C, whereas that of 'Autumn Bliss' and 'Reveille' declined almost 50% when temperature increased to 30 or 35 °C.

Leaf Gas Exchange Response of 'Arapaho' Blackberry and Six Red Raspberry Cultivars to Moderate and High Temperatures