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Four different techniques were applied for the production of  233 U alpha recoil ion sources, providing  229 Th ions. They were compared with respect to a minimum energy spread of the  229 Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. A direct validation for the estimated recoil ion rate was obtained by collecting  228 Th recoil ions from  232 U recoil ion sources prepared by self-adsorption and Molecular Plating. The chelation and the self-adsorption based approaches appear most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.

Alpha spectrometric characterization of thin 233 U sources for 229(m) Th production