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Digital micromirror devices (DMDs) show great promise for use as intensity spatial light modulators. When used in conjunction with pulsed lasers of a timescale below the DMD pixel switching time, DMDs are generally only used as binary intensity masks (i.e., "on" or "off" intensity for each mask pixel). In this work, we show that by exploiting the numerical aperture of an optical system during the design of binary masks, near-continuous intensity control can be accessed, whilst still maintaining high-precision laser-machining resolution. Complex features with ablation depths up to ∼60  nm, corresponding to grayscale values in bitmap images, are produced in single pulses via ablation with 150 fs laser pulses on nickel substrates, with lateral resolutions of ∼2.5  μm.

Single-pulse ablation of multi-depth structures via spatially filtered binary intensity masks