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The chemical erosion behaviour of doped graphites eroded by mono -energetic and mass-separated hydrogen ion beams and by hydrogen containing planar inductively coupled RF plasmas is compared. 30 eV D ion beams (90eV D3 + ) were produced at the Garching high current ion source with fluxes in the order of 10 19 m -2 s -1 . The erosion yield was obtained by weight loss measurements (in situ). The flux of 3 × 10 21 m -2 s -1 from the plasma has ~99% atomic D (H) with an energy equivalent to the plasma temperature of 500 K and only ~1% ions. The ions get the energy of the 30 V bias voltage and consists of ~90% D3 + (10 eV D), ~9% D2 + , and ~1% D + . The time resolution of the erosion yield in the plasma experiment was measured spectroscopically and calibrated by weight loss. The total erosion yield of pu re graphites at room temperature for both eroding experiments is quite comparable (30 eV D ion beam: 3-4%; 30 eV biased D2 plasma: ~1% ), if the atomic D is used for the fluence scaling in the plasma experiment. Under the erosion conditions in the plasma each thermal atomic hydrogen reacts nearly like an energetic ion. For doped graphites the reduction of the erosion for both experiments shows about the same fluence dependence. But the produced surface morphology is different: For the ion beam the dopant grains seem to shield the underlying carbon, while for the plasma exposure the carbon is definitely also eroded beneath the grains, so that dopant grains are undercut.

Chemical Erosion Behaviour of Doped Graphites under Hydrogen Impact: A Comparison of Ion Beam Experiments and Planar Inductively Coupled RF Plasmas