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We investigated the transport titanium ions produced in a reactive high-powerimpulse magnetron sputtering (HiPIMS) device used for TiN coating deposition.Time-resolved mass spectrometry measurements of ionized sputtered atomscorrelated to time-resolved tuneable diode-laser induced fluorescence(TR-TDLIF) measurements of neutral sputtered atoms were used to understandtransport features. Based on ion energy distributions of Ti$^+$, we identifiedfour populations of ions and explore their physical origins. The signals of allion populations decrease strongly when only 1% N$_2$ is added to the Ar/N$_2$gas mixture. Time resolved mass spectrometry confirms the result reported inprevious work: the fast target poisoning when nitrogen is added in HiPIMSdischarges. Based on the measured energy distribution functions of Ti$^{++}$,N$^+$, N$_2^+$, and Ar$^+$, we discuss the production of these ions in HiPIMSdischarges. The temperature of thermalized sputtered neutral atoms determinedby previous TR-TDLIF measurements evidences the physical origin of an ionpopulation with energies lower than 4 eV. According to discharge pressure,cathode voltage, and ion type, we also discuss the physical origins ofhigh-energy ions (>4 eV).

Ionized particle transport in reactive HiPIMS discharge: correlation between the energy distribution functions of neutral and ionized atoms