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The drying of a drop containing particles often results in the accumulationof the particles at the contact line. In this work, we investigate the dryingof an aqueous colloidal drop surrounded by a hydrogel that is also evaporating.We combine theoretical and experimental studies to understand how thesurrounding vapor concentration affects the particle deposit during theconstant radius evaporation mode. In addition to the common case of evaporationon an otherwise dry surface, we show that in a configuration where liquid isevaporating from a flat surface around the drop, the singularity of theevaporative flux at the contact line is suppressed and the drop evaporation ishomogeneous. For both conditions, we derive the velocity field and we establishthe temporal evolution of the number of particles accumulated at the contactline. We predict the growth dynamics of the stain and the drying timescales.Thus, dry and wet conditions are compared with experimental results and wehighlight that only the dynamics is modified by the evaporation conditions, notthe final accumulation at the contact line.

Coffee-stain growth dynamics on dry and wet surfaces