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Surface morphology of size-selected silver nanocluster films grown by dcmagnetron sputtering has been investigated by means of an atomic forcemicroscopy (AFM). From the height-height correlation functions ( HHCF) obtainedfrom corresponding AFM images, the scaling exponents are calculated and twotypes of growth regimes have been observed. In the first regime, the growthexponent is found to be \b{eta}1 = 0.27\pm0.07 close to the KPZ growthexponent, while in the second growth regime shadowing effect plays dominantrole which gives the growth exponent value \b{eta}2 = 0.88\pm0.28. On the otherhand for the whole deposition regime, the roughness exponent value is found tobe constant around {\alpha}= 0.76\pm0.02. UV-vis spectroscopy measurementsuggests how the average reflectance of the film surface changes with differentgrowth times.

Surface scaling behaviour of size-selected Ag-nanocluster film growing under subsequent shadowing process