English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools annual

Global: Zendy Free Plan

Global: Zendy Tools monthly

Global: Zendy Plus monthly

We study the microstructure and magnetic properties of Ni80Fe20 thin filmsgrown by high power impulse magnetron sputtering (HiPIMS), and compare withfilms grown by dc magnetron sputtering (dcMS). The films were grown under atilt angle of 35{\deg} to identical thickness of 37 nm using both techniques,at different pressure (0.13-0.73 Pa) and substrate temperature (roomtemperature and 100 {\deg}C). All of our films display effective in-planeuniaxial anisotropy with square easy axis and linear hard axis magnetizationtraces. X-ray diffraction reveals that there is very little change in grainsize within the pressure and temperature ranges explored. However, variationsin film density, obtained by X-ray reflectivity measurements, with pressurehave a significant effect on magnetic properties such as anisotropy field (Hk)and coercivity (Hc). Depositions where adatom energy is high produce densefilms, while low adatom energy results in void-rich films with higher Hk andHc. The latter applies to our dcMS deposited films at room temperature and highpressure. However, the HiPIMS deposition method gives higher adatom energy thanthe dcMS and results in dense films with low Hk and Hc. The surface roughnessis found to increase with increased pressure, in all cases, however it showednegligible contribution to the increase in Hk and Hc.

Comparison of magnetic and structural properties of permalloy Ni80Fe20 grown by dc and high power impulse magnetron sputtering