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The atmospheric pressure low-temperature homogeneous discharge using helium and nitrogen, both known for industrial applications, was reviewed. In case of helium, metastable atoms (2 1 s and 2 3 s) produced in the glow discharge were able to dissociate mixed molecular gases to produce radicals or atoms. Radical species undergo chemical reactions, such as oxidation or nitration reaction and form products on the electrode surfaces. Applications of helium atmospheric pressure glow discharge including surface treatment of plastic films to enhance adhesibility with glue, weakening strength with pressure-sensitive glue, and deposition of solid material on a flat plate or powder surfaces, were described. Moreover, the microwave low-temperature discharge using nitrogen, as a cost-saving carrier gas, were introduced for the surface cleaning of silicon wafer.

Low-temperature atmospheric discharge plasma and its applications for the surface treatment