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Targets of 58 Ni and 60 Ni with areal density between 71 and 105 μg/cm 2 backed with polyimide foil of 35-40 μg/cm 2 were prepared by sputtering with Ar ions produced by a home made sputtering device at the Target Laboratory, University of Jyväskylä. The efficiency of the procedure was about 20 %.

Fine plastic foil as backing for sputtered nickel targets